Technical features
- Optional Light Sources: 405nm LED, 405nm LD, 355nm DPSSL
- Supports 4-8 inches substrate size
- High refresh rate spatial light modulator maskless direct writing
- Auto-Focus
- 3D topography exposure, interference exposure, polarization exposure
- Multi-mode exposure (scanning exposure, stepping exposure)
- Multi-task automatic operation
- Supports GDSII, BMP, STL, and other file formats
Specifications
* Specifications depend on the optional platform size.
* Final interpretation rights belong to the company.
Example applications
